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Multiple patterning
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#	Item
41	PDF Document Add to Reading List Source URL: s3.mentor.com.s3.amazonaws.com Language: English - Date: 2012-06-14 13:53:12 Multiple patterning Electronic engineering Computational lithography Mentor Graphics 45 nanometer
42	White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:30:19 Design closure Signoff Multiple patterning Physical design Dermatopontin Standard cell DPT vaccine Validator Application-specific integrated circuit Electronic engineering Electronic design automation Design rule checking
43	1 Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control Rani S. Ghaida, George Torres, and Puneet Gupta EE Dept., University of California, Los Angeles Add to Reading List Source URL: nanocad.ee.ucla.edu Language: English - Date: 2010-07-29 18:01:55 Electronic design automation Multiple patterning Extreme ultraviolet lithography 32 nanometer 65 nanometer Standard cell Photoresist Photomask Overlay Control Microtechnology Electronic engineering Materials science
44	Sagantec’s nmigrate adopted and deployed for 14nm technology Major semiconductor company successfully migrated 28nm libraries to 14nm FinFET Santa Clara, California - May 29, [removed]Sagantec announced that its nmigrate Add to Reading List Source URL: www.sagantec.com Language: English - Date: 2014-06-17 16:10:10 Electronic design Integrated circuits Design rule checking Multigate device Multiple patterning Physical design Integrated circuit layout Process migration Standard cell Electronic engineering Electronics Electronic design automation
45	Sagantec announces nmigrate™ Migration and DRC correction tool for advanced nanometer technologies SANTA CLARA, California – May 14, 2012 – Sagantec announced today its nmigrate layout migration and optimization to Add to Reading List Source URL: www.sagantec.com Language: English - Date: 2014-06-17 16:11:45 Integrated circuit layout Multiple patterning Electronic engineering Design rule checking Process migration
46	Sagantec Demos and Presentations Featuring the following presentations and demos: • • • • Add to Reading List Source URL: www.sagantec.com Language: English - Date: 2014-06-17 16:09:36 Migration Standard cell Process migration Multiple patterning Electronic engineering Electronic design automation Design rule checking
47	Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r Add to Reading List Source URL: www.multibeamcorp.com Language: English - Date: 2014-06-26 13:06:22 Maskless lithography Photolithography Electron beam lithography Multiple patterning Resist Wafer Lithography Immersion lithography Photomask Technology Semiconductor device fabrication Microtechnology
48	Executive Briefing: Getting Direct On Litho Posted on: October 17th, [removed]Posted by : Mark LaPedus One-on-one with David Lam about next-generation lithography, where he’s placing his bets, and what’s changing in th Add to Reading List Source URL: www.multibeamcorp.com Language: English - Date: 2014-06-26 13:05:59 Semiconductor device fabrication Next-generation lithography Electron beam lithography Photolithography Visual arts Multiple patterning Nanoimprint lithography Lithography Wafer Technology Microtechnology Maskless lithography
49	List of Leading EUVL Technical Challenges 2014 International Workshop on EUVL Makena Beach, Maui, Hawaii, June 23-37, 2014 Source Power scaling of Sn LPP sources to 250 W Add to Reading List Source URL: www.euvlitho.com Language: English - Date: 2014-02-06 23:29:18 Resist Ultraviolet Electromagnetism Physics Photomask Extreme ultraviolet lithography Multiple patterning Extreme ultraviolet
50	2014 International Workshop on EUV Lithography Makena Beach & Golf Resort, Maui, Hawaii June 23-27, 2014 FIRST CALL FOR PAPERS We are inviting presentations and poster papers for the 2014 International Workshop on EUV Li Add to Reading List Source URL: www.euvlitho.com Language: English - Date: 2014-03-07 16:40:53 Multiple patterning Visual arts Extreme ultraviolet Abstract management Abstract Lithography Makena State Park Extreme ultraviolet lithography Knowledge Electromagnetic radiation

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